Acceleration effect of CuCN in Ag electroplating for ultralarge-scale interconnects

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초록

The addition of CuCN accelerated the deposition rate in cyanide-based Ag electroplating. The catalytic effect came from the high-order complexation of Cu with the free CN- ions in electrolyte. It changed the equilibrium state of the electrolyte, presented as an increase in the amount of Ag (CN)(2)(-) compared to Ag (CN)(3)(2-). Because Ag (CN)(2)(-) could be reduced more easily, Ag electroplating was accelerated. Fourier transform infrared analysis showed the equilibrium change with the increase in Ag (CN)(2)(-) peak according to the CuCN addition. For superfilling, it is necessary to localize the complexation on the Cu surface. (C) 2007 The Electrochemical Society.

키워드

SUPERCONFORMAL ELECTRODEPOSITION; ELECTROMIGRATION RESISTANCE; COPPER; SILVER; METALLIZATION; SYSTEM; FILM
제목
Acceleration effect of CuCN in Ag electroplating for ultralarge-scale interconnects
저자
Cho, Sung Ki; Lee, Jong Kyun; Kim, Soo-Kil; Kim, Jae Jeong
DOI
10.1149/1.2769103
발행일
2007-10
유형
Article
저널명
Electrochemical and Solid-State Letters
권
10
호
10
페이지
D116 ~ D119