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Acceleration effect of CuCN in Ag electroplating for ultralarge-scale interconnects
- Cho, Sung Ki;
- Lee, Jong Kyun;
- Kim, Soo-Kil;
- Kim, Jae Jeong
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0초록
The addition of CuCN accelerated the deposition rate in cyanide-based Ag electroplating. The catalytic effect came from the high-order complexation of Cu with the free CN- ions in electrolyte. It changed the equilibrium state of the electrolyte, presented as an increase in the amount of Ag (CN)(2)(-) compared to Ag (CN)(3)(2-). Because Ag (CN)(2)(-) could be reduced more easily, Ag electroplating was accelerated. Fourier transform infrared analysis showed the equilibrium change with the increase in Ag (CN)(2)(-) peak according to the CuCN addition. For superfilling, it is necessary to localize the complexation on the Cu surface. (C) 2007 The Electrochemical Society.
키워드
SUPERCONFORMAL ELECTRODEPOSITION; ELECTROMIGRATION RESISTANCE; COPPER; SILVER; METALLIZATION; SYSTEM; FILM
- 제목
- Acceleration effect of CuCN in Ag electroplating for ultralarge-scale interconnects
- 저자
- Cho, Sung Ki; Lee, Jong Kyun; Kim, Soo-Kil; Kim, Jae Jeong
- 발행일
- 2007-10
- 유형
- Article
- 권
- 10
- 호
- 10
- 페이지
- D116 ~ D119
- 언어
- ENG
- 출판사
- ELECTROCHEMICAL SOC INC
- 발행국가
- 미국
- ISSN
- E 1944-8775
P 1099-0062