Effect of Enhanced Thermal Stability of Alumina Support Layer on Growth of Vertically Aligned Single-Walled Carbon Nanotubes and Their Application in Nanofiltration Membranes

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초록

We investigate the thermal stability of alumina supporting layers sputtered at different conditions and its effect on the growth of aligned single-walled carbon nanotube arrays. Radio frequency magnetron sputtering of alumina under oxygen-argon atmosphere produces a Si-rich alumina alloy film on a silicon substrate. Atomic force microscopy on the annealed catalysts reveals that Si-rich alumina films are more stable than alumina layers with low Si content at the elevated temperatures at which the growth of single-walled carbon nanotubes is initiated. The enhanced thermal stability of the Si-rich alumina layer results in a narrower (< 2.2 nm) diameter distribution of the single-walled carbon nanotubes. Thanks to the smaller diameters of their nanotube pores, membranes fabricated with vertically aligned nanotubes grown on the stable layers display improved ion selectivity.

키워드

Single-walled carbon nanotubeCatalystAluminaCNT membraneTUNABLE ION SELECTIVITYFORESTSEVAPORATIONDEPOSITIONFILMSCOMPOSITESDENSITYSI(001)PORESWATER
제목
Effect of Enhanced Thermal Stability of Alumina Support Layer on Growth of Vertically Aligned Single-Walled Carbon Nanotubes and Their Application in Nanofiltration Membranes
저자
In, Jung BinCho, Kang RaeTung Xuan TranKim, Seok-MinWang, YinminGrigoropoulos, Costas P.Noy, AleksandrFornasiero, Francesco
DOI
10.1186/s11671-018-2585-3
발행일
2018-06
유형
Article
저널명
Nanoscale Research Letters
13