Study on residual stress in viscoelastic thin film using curvature measurement method

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초록

Using LSM (laser scanning method), the radius of curvature due to thermal deformation in polyimide film coated on Si substrate is measured. Since the polyimide film shows viscoelastic behavior, i.e., the modulus and deformation of the film vary with time and temperature, we estimate the relaxation modulus and the residual stresses of the polyimide film by measuring the radius of curvature and subsequently by performing viscoelastic analysis. The residual stresses relax by an amount of 10% at 100degreesC and 20% at 150degreesC for two hours.

키워드

SUBSTRATE
제목
Study on residual stress in viscoelastic thin film using curvature measurement method
저자
Im, YT; Kim, JH; Choi, ST
DOI
10.1109/EMAP.2001.984007
발행일
2001
유형
Proceedings Paper
저널명
ADVANCES IN ELECTRONIC MATERIALS AND PACKAGING 2001
페이지
341 ~ 346