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Study on residual stress in viscoelastic thin film using curvature measurement method
- Im, YT;
- Kim, JH;
- Choi, ST
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1초록
Using LSM (laser scanning method), the radius of curvature due to thermal deformation in polyimide film coated on Si substrate is measured. Since the polyimide film shows viscoelastic behavior, i.e., the modulus and deformation of the film vary with time and temperature, we estimate the relaxation modulus and the residual stresses of the polyimide film by measuring the radius of curvature and subsequently by performing viscoelastic analysis. The residual stresses relax by an amount of 10% at 100degreesC and 20% at 150degreesC for two hours.
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SUBSTRATE
- 제목
- Study on residual stress in viscoelastic thin film using curvature measurement method
- 저자
- Im, YT; Kim, JH; Choi, ST
- 발행일
- 2001
- 유형
- Proceedings Paper
- 저널명
- ADVANCES IN ELECTRONIC MATERIALS AND PACKAGING 2001
- 페이지
- 341 ~ 346
- 언어
- ENG
- 출판사
- IEEE
- 발행국가
- 미국
- 분량
- 6 페이지