Low temperature carrier transport mechanism in high-mobility zinc oxynitride thin-film transistors

  • Kim, Hee-Joong; 
  • Hong, Sae-Young; 
  • Kim, Dae-Hwan; 
  • Jeong, Hwan-Seok; 
  • Kwon, Hyuck-In
Citations

WEB OF SCIENCE

6
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6

초록

The authors investigate the low-temperature carrier transport mechanism in high-mobility zinc oxy-nitride (ZnON) thin-film transistors (TFTs) over a wide range of operating temperatures below room temperature (90-293 K) by analyzing the temperature-dependent field-effect characteristics. In the subthreshold and transition regions, the variable range hopping and trap-limited band transport are considered as dominant carrier transport mechanisms in the ZnON TFT at temperatures below similar to 207K and above similar to 243 K, respectively. In the above-threshold region, the field-effect mobility almost linearly depends on 1/T (T: absolute temperature) at all temperatures, which represents that the trap-limited band transport is the dominant carrier transport mechanism through the entire temperature range of 90 to 293K in the fabricated ZnON TFT. Approximately 1 order of magnitude higher subgap density of states is extracted from the fabricated ZnON TFT compared with a conventional amorphous indium-gallium-zinc oxide TFT, which is primarily attributed to the large number of defective ZnXNY bonds inside the ZnON. (C) 2017 American Vacuum Society.

키워드

ZNON; PERFORMANCE; EXTRACTION; STABILITY; NITROGEN; DEVICES; STATES
제목
Low temperature carrier transport mechanism in high-mobility zinc oxynitride thin-film transistors
저자
Kim, Hee-Joong; Hong, Sae-Young; Kim, Dae-Hwan; Jeong, Hwan-Seok; Kwon, Hyuck-In
DOI
10.1116/1.4983528
발행일
2017-05
유형
Article
저널명
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
권
35
호
3