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Characterization and Selective Properties of Electroless Deposited All Wet Contact Electrode
- Kim, Areum;
- Lee, Seon Jea;
- Choi, Eunmi;
- Pyo, Sung Gyu
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3초록
We report here the formation of an electrode through a selective electroless plating process. It consists of pre-treatment, selected Ni electroless plating, and Cu electroless chemical plating. Through the selective electrode formation technique using Pd/Ni/Cu, we established a high-efficiency and low-cost process for the manufacture of crystalline silicon solar cells. Measurements with a solar simulator showed that an open-circuit voltage of 0.684 V, short-circuit current density of 32.3 mA/cm(2), form factor of 75.39%, and an efficiency of 18.21% was obtained for a monocrystalline silicon solar cell. (C) 2014 The Electrochemical Society. All rights reserved.
키워드
SILICON SOLAR-CELLS; NICKEL SILICIDE; THIN-FILMS; METALLIZATION; SYSTEM; NISI; PHOTOVOLTAICS; EFFICIENCY
- 제목
- Characterization and Selective Properties of Electroless Deposited All Wet Contact Electrode
- 저자
- Kim, Areum; Lee, Seon Jea; Choi, Eunmi; Pyo, Sung Gyu
- 발행일
- 2014-01
- 유형
- Article
- 권
- 161
- 호
- 3
- 페이지
- D118 ~ D124
- 언어
- ENG
- 출판사
- ELECTROCHEMICAL SOC INC
- 발행국가
- 미국
- ISSN
- E 1945-7111
P 0013-4651