Characterization and Selective Properties of Electroless Deposited All Wet Contact Electrode

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초록

We report here the formation of an electrode through a selective electroless plating process. It consists of pre-treatment, selected Ni electroless plating, and Cu electroless chemical plating. Through the selective electrode formation technique using Pd/Ni/Cu, we established a high-efficiency and low-cost process for the manufacture of crystalline silicon solar cells. Measurements with a solar simulator showed that an open-circuit voltage of 0.684 V, short-circuit current density of 32.3 mA/cm(2), form factor of 75.39%, and an efficiency of 18.21% was obtained for a monocrystalline silicon solar cell. (C) 2014 The Electrochemical Society. All rights reserved.

키워드

SILICON SOLAR-CELLS; NICKEL SILICIDE; THIN-FILMS; METALLIZATION; SYSTEM; NISI; PHOTOVOLTAICS; EFFICIENCY
제목
Characterization and Selective Properties of Electroless Deposited All Wet Contact Electrode
저자
Kim, Areum; Lee, Seon Jea; Choi, Eunmi; Pyo, Sung Gyu
DOI
10.1149/2.072403jes
발행일
2014-01
유형
Article
저널명
Journal of the Electrochemical Society
권
161
호
3
페이지
D118 ~ D124