In-situ observation of phase transformation in amorphous silicon during Joule-heating induced crystallization process

  • Kim, Dong-Hyun; 
  • Hong, Won-Eui; 
  • Ro, Jae-Sang; 
  • Lee, Seong Hyuk; 
  • Lee, Chang-Hoon; 
  • 외 1명
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초록

During the Joule-heating induced crystallization (JIC) process of amorphous silicon for display applications, its phase transformation from amorphous to polycrystalline phases occurs through two different kinetic paths of either solid-to-solid or solid-to-liquid-to-solid phases. Depending on input conditions such as power density and pulsing time, each path results in nano-crystalline silicon phases or large grain structures produced by lateral growth, respectively. In this study, the phase-transformation phenomena during the JIC process were detected electrically and optically by the in-situ measurements of input voltage/current and normal reflectance at wavelength of 532 nm. The temperature field estimated from a simple conduction model confirms the phase-transformation behavior observed experimentally. In addition we could obtain the poly-Si structure produced by solid phase crystallization having the process time of 250 As and reaching the highest temperature around 1350 K. (C) 2011 Elsevier B.V. All rights reserved.

키워드

Joule-heating induced crystallization; In-situ measurements; Phase transformation; Amorphous silicon; Polycrystalline silicon; EXCIMER-LASER CRYSTALLIZATION; THIN-FILMS; LPCVD; TECHNOLOGY; GLASS; TFTS
제목
In-situ observation of phase transformation in amorphous silicon during Joule-heating induced crystallization process
저자
Kim, Dong-Hyun; Hong, Won-Eui; Ro, Jae-Sang; Lee, Seong Hyuk; Lee, Chang-Hoon; Park, Seungho
DOI
10.1016/j.tsf.2011.03.053
발행일
2011-06
유형
Article
저널명
Thin Solid Films
권
519
호
16
페이지
5516 ~ 5522