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Study on residual stress in viscoelastic thin film using curvature measurement method
- Im, YT;
- Choi, ST;
- Park, TS;
- Kim, JH
Citations
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6초록
Using LSM (laser scanning method), the radius of curvature due to thermal deformation in polyimide film coated on Si substrate is measured. Since the polyimide film shows viscoelastic behavior, i.e., the modulus and deformation of the film vary with time and temperature, we estimate the relaxation modulus and the residual stresses of the polyimide film by measuring the radius of curvature and subsequently by performing viscoelastic analysis. The residual stresses relax by an amount of 10% at 100degreesC and 20% at 150degreesC for two hours.
키워드
residual stress; curvature; viscoelastic; elastic-viscoelastic correspondence principle; CTE mismatch; SUBSTRATE
- 제목
- Study on residual stress in viscoelastic thin film using curvature measurement method
- 저자
- Im, YT; Choi, ST; Park, TS; Kim, JH
- 발행일
- 2004-01
- 유형
- Article
- 권
- 18
- 호
- 1
- 페이지
- 12 ~ 19
- 언어
- ENG
- 출판사
- KOREAN SOC MECHANICAL ENGINEERS
- 발행국가
- 대한민국
- 분량
- 8 페이지
- ISSN
- P 1226-4865