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A subthreshold current model for nanoscale short channel junctionless MOSFETs applicable to symmetric and asymmetric double-gate structure
- Jin, Xiaoshi;
- Liu, Xi;
- Kwon, Hyuck-In;
- Lee, Jung-Hee;
- Lee, Jong-Ho
Citations
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47Citations
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54초록
We proposed models of subthreshold characteristics for deep nanoscale short channel asymmetric junctionless Double-Gate (DG) MOSFETs. Models were derived by solving 2-D Poisson's equation using variable separation technique. The subthreshold behavior with structure asymmetry such as different gate oxide thicknesses and different gate biases between the front-gate and back-gate can be exactly described. Design parameters such as body doping, body thickness and channel length were considered. The models were verified by comparing with device simulations' results. (C) 2013 Elsevier Ltd. All rights reserved.
키워드
Nanoscale; Short channel; Junctionless; Double-gate MOSFETs; Modeling; NANOWIRE TRANSISTORS
- 제목
- A subthreshold current model for nanoscale short channel junctionless MOSFETs applicable to symmetric and asymmetric double-gate structure
- 저자
- Jin, Xiaoshi; Liu, Xi; Kwon, Hyuck-In; Lee, Jung-Hee; Lee, Jong-Ho
- 발행일
- 2013-04
- 유형
- Article
- 권
- 82
- 페이지
- 77 ~ 81
- 언어
- ENG
- 출판사
- PERGAMON-ELSEVIER SCIENCE LTD
- 발행국가
- 영국
- 분량
- 5 페이지
- ISSN
- E 1879-2405
P 0038-1101