Light-induced hysteresis and recovery behaviors in photochemically activated solution-processed metal-oxide thin-film transistors

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초록

In this report, photo-induced hysteresis, threshold voltage (V-T) shift, and recovery behaviors in photochemically activated solution-processed indium-gallium-zinc oxide (IGZO) thin-film transistors (TFTs) are investigated. It was observed that a white light illumination caused negative V-T shift along with creation of clockwise hysteresis in electrical characteristics which can be attributed to photo-generated doubly ionized oxygen vacancies at the semiconductor/gate dielectric interface. More importantly, the photochemically activated IGZO TFTs showed much reduced overall V-T shift compared to thermally annealed TFTs. Reduced number of donor-like interface states creation under light illumination and more facile neutralization of ionized oxygen vacancies by electron capture under positive gate potential are claimed to be the origin of the less V-T shift in photochemically activated TFTs. (C) 2014 AIP Publishing LLC.

키워드

FABRICATION; ROUTE
제목
Light-induced hysteresis and recovery behaviors in photochemically activated solution-processed metal-oxide thin-film transistors
저자
Jo, Jeong-Wan; Kim, Yong-Hoon; Park, Sung Kyu
DOI
10.1063/1.4891541
발행일
2014-07
유형
Article
저널명
Applied Physics Letters
권
105
호
4