Complete wetting characteristics of micro/nano dual-scale surface by plasma etching to give nanohoneycomb structure

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초록

A variety of flat superhydrophilic surfaces have been fabricated for biological and industrial applications. We report here the preparation of a simple and inexpensive non-polar curved superhydrophilic surface. This surface has dual-scale surface roughness, on both micro-and nanoscales. Curved surfaces with a near-zero water contact angle and 'complete wetting' are demonstrated. By using a conventional plasma etching process, which creates microscale irregularity on an aluminum surface, followed by an anodization process which further modifies the plasma etched surface by creating nanoscale structures, we generate a surface having irregularities on two-scales. This surface displays a semi-permanent superhydrophilic property (if the surface has no damage by the exterior failure), having a near-zero contact angle with water drops. We further report a simple and inexpensive curved (i.e., non-planar) superhydrophilic structure with a near-zero contact angle. The dual-scale character of the surface increases the capillary force effect and reduces the energy barriers of the nanostructures. Crown Copyright (C) 2011 Published by Elsevier B. V. All rights reserved.

키워드

Nanohoneycomb; Plasma etch; Superhydrophilic surface; Dual-scale; Anodization; ELECTRIC-FIELD; NANOSTRUCTURES; LITHOGRAPHY; FABRICATION; MECHANISMS
제목
Complete wetting characteristics of micro/nano dual-scale surface by plasma etching to give nanohoneycomb structure
저자
Kim, Dongseob; Lee, Sangmin; Hwang, Woonbong
DOI
10.1016/j.cap.2011.06.003
발행일
2012-01
유형
Article
저널명
Current Applied Physics
권
12
호
1
페이지
219 ~ 224