Highly Stable and Imperceptible Electronics Utilizing Photoactivated Heterogeneous Sol-Gel Metal-Oxide Dielectrics and Semiconductors

  • Jo, Jeong-Wan; 
  • Kim, Jaekyun; 
  • Kim, Kyung-Tae; 
  • Kang, Jin-Gu; 
  • Kim, Myung-Gil; 
  • ... Park, Sung Kyu; 
  • 외 3명
Citations

WEB OF SCIENCE

142
Citations

SCOPUS

148

초록

Incorporation of Zr into an AlOx matrix generates an intrinsically activated ZAO surface enabling the formation of a stable semiconducting IGZO film and good interfacial properties. Photochemically annealed metal-oxide devices and circuits with the optimized sol-gel ZAO dielectric and IGZO semiconductor layers demonstrate the high performance and electrically/mechanically stable operation of flexible electronics fabricated via a low-temperature solution process.

키워드

Deep UV photo-chemical activation; Flexible metal oxide gate dielectric; Low temperature; Rollable metal oxide TFT; Solution process; THIN-FILM TRANSISTORS; FIELD-EFFECT TRANSISTORS; LOW-TEMPERATURE FABRICATION; GATE DIELECTRICS; ROOM-TEMPERATURE; PERFORMANCE; SUBSTRATE; CIRCUITS; ROUTE; TFTS
제목
Highly Stable and Imperceptible Electronics Utilizing Photoactivated Heterogeneous Sol-Gel Metal-Oxide Dielectrics and Semiconductors
저자
Jo, Jeong-Wan; Kim, Jaekyun; Kim, Kyung-Tae; Kang, Jin-Gu; Kim, Myung-Gil; Kim, Kwang-Ho; Ko, Hyungduk; Kim, Yong-Hoon; Park, Sung Kyu
DOI
10.1002/adma.201404296
발행일
2015-02
유형
Article
저널명
Advanced Materials
권
27
호
7
페이지
1182 ~ 1188