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Enhanced thermoelectric properties of thermal treated Sb2Te3 thin films
- Hong, Ji-Eun;
- Lee, Sang-Kwon;
- Yoon, Soon-Gil
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36초록
The 500 nm-thick Sb2Te3 films were deposited onto SiO2/Si substrates using rf magnetron sputtering and annealment at various temperatures for 5 min under an Ar atmosphere. Oxygen incorporated into the films contributed to the compositional stability at an annealing temperature of 320 degrees C. Samples annealed at 320 degrees C exhibited conductivity of 1824 S/cm, Seebeck coefficient of 283 mu V/K, and a thermal conductivity of 3.0 +/- 0.20 W/mK at room temperature, and thermoelectric figure of merit (ZT) of approximately 1.5. (C) 2013 Elsevier B.V. All rights reserved.
키워드
Sb2Te3 thin films; Radio-frequency sputtering; Theromoelectric properties; Oxygen incorporation; Annealing temperature; GE2SB2TE5; DEVICES; MERIT
- 제목
- Enhanced thermoelectric properties of thermal treated Sb2Te3 thin films
- 저자
- Hong, Ji-Eun; Lee, Sang-Kwon; Yoon, Soon-Gil
- 발행일
- 2014-01
- 유형
- Article
- 권
- 583
- 페이지
- 111 ~ 115
- 언어
- ENG
- 출판사
- ELSEVIER SCIENCE SA
- 발행국가
- 스위스
- 분량
- 5 페이지
- ISSN
- E 1873-4669
P 0925-8388