Nanoscale Antiferromagnetic Domain Imaging using Full-Field Resonant X-ray Magnetic Diffraction Microscopy

  • Choi, Taeyang; 
  • Zhang, Zhan; 
  • Kim, Hoon; 
  • Park, Sunwook; 
  • Kim, Jong-Woo; 
  • ... Chang, Seo Hyoung; 
  • 외 4명
Citations

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4
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SCOPUS

4

초록

The physical properties of magnetic materials frequently depend not only on the microscopic spin and electronic structures, but also on the structures of mesoscopic length scales that emerge, for instance, from domain formations, or chemical and/or electronic phase separations. However, experimental access to such mesoscopic structures is currently limited, especially for antiferromagnets with net zero magnetization. Here, full-field microscopy and resonant magnetic X-ray diffraction are combined to visualize antiferromagnetic (AF) domains of the spin–orbit Mott insulator Sr2IrO4 with area over ≈0.1 mm2 and with spatial resolution as high as ≈150 nm. With the unprecedented wide field of views and high spatial resolution, an intertwining of two AF domains on a length comparable to the measured average AF domain wall width of 545 nm is revealed. This mesoscopic structure comprises a substantial portion of the sample surface, and thus can result in a macroscopic response, which is unexpected from its microscopic magnetic structure. In particular, this symmetry analysis shows that the inversion symmetry, which is preserved by the microscopic AF order, becomes ill-defined at the mesoscopic length scale. This result underscores the importance of this novel technique for a thorough understanding of the physical properties of antiferromagnets. © 2022 Wiley-VCH GmbH.

키워드

antiferromagnetic domains; full-field microscopy; resonant magnetic X-ray diffraction; SPIN; PHYSICS; WALLS
제목
Nanoscale Antiferromagnetic Domain Imaging using Full-Field Resonant X-ray Magnetic Diffraction Microscopy
저자
Choi, Taeyang; Zhang, Zhan; Kim, Hoon; Park, Sunwook; Kim, Jong-Woo; Lee, Kyeong Jun; Islam, Zahir.; Welp, Ulrich; Chang, Seo Hyoung; Kim, B.J.
DOI
10.1002/adma.202200639
발행일
2022-07
유형
Article
저널명
Advanced Materials
권
34
호
29