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Investigation of Carrier Transport Mechanism in High Mobility ZnON Thin-Film Transistors
- Jeong, Chan-Yong;
- Kim, Hee-Joong;
- Kim, Dae-Hwan;
- Kim, Hyun-Suk;
- Kim, Tae Sang;
- ... Kwon, Hyuck-In;
- 외 3명
WEB OF SCIENCE
20SCOPUS
23초록
In this letter, the carrier transport mechanism in a high-mobility zinc oxynitride (ZnON) thin-film transistor (TFT) is investigated by analyzing the gate bias and temperature dependence of conductance and intrinsic field-effect mobility (mu FEi) in the subthreshold and above-threshold regions, respectively. The measured drain currents increase with a temperature and show a thermally activated Arrhenius-like behavior in the subthreshold region. The experimental results are well explained using a Meyer-Neldel rule, which suggests that the trap-limited conduction is the dominant carrier transport mechanism in the ZnON TFT in the subthreshold region. The carrier transport mechanism in the ZnON TFT in the above-threshold region is investigated by examining the gate overdrive voltage (V-OV) and temperature dependence of mu FEi. mu FEi extracted from the ZnON TFT decreases with an increase in V-OV and temperature, which suggests that the phonon scattering is the most probable mechanism limiting mu FEi in the ZnON TFT in the above-threshold region.
키워드
- 제목
- Investigation of Carrier Transport Mechanism in High Mobility ZnON Thin-Film Transistors
- 저자
- Jeong, Chan-Yong; Kim, Hee-Joong; Kim, Dae-Hwan; Kim, Hyun-Suk; Kim, Tae Sang; Seon, Jong-Baek; Lee, Sunhee; Kim, Dae Hwan; Kwon, Hyuck-In
- 발행일
- 2016-12
- 유형
- Article
- 권
- 37
- 호
- 12
- 페이지
- 1570 ~ 1573
- 언어
- ENG
- 출판사
- IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
- 발행국가
- 미국
- 분량
- 4 페이지
- ISSN
- E 1558-0563
P 0741-3106