상세 보기
Design of bulk fin-type field-effect transistor considering gate work-function
- Han, Kyoung-Rok;
- Choi, Byung-Kil;
- Kwon, Hyuck-In;
- Lee, Jong-Ho
WEB OF SCIENCE
11초록
We proposed a new body-tied triple-gate fin-type field-effect transistor (bulk FinFET) which has different gate work-functions on the top-and side-channel regions. The effect of gate work-function on the characteristics of the bulk FinFETs was studied by using three-dimensional device simulator. By increasing the top-gate work-function ((phi(TG)) at a fixed side-gate work-function ((phi(SG)) of the bulk FinFET, threshold voltage (V-th) increases and off-state leakage current (I (off)) reduces significantly without increasing doping concentration of the fin body. The bulk FinFETs with the low body doping and the threshold voltage controlled by midgap-gate work-function shown very small dependence on the comer shape, but shown very poor short channel effect (SCE). It was also shown that devices with the V-th controlled by body doping shows significant corner effect and the effect becomes small as the fin width decreases. By applying our approach, we could reduce the off-current by more than 10 times without increasing fin body doping concentration.
키워드
- 제목
- Design of bulk fin-type field-effect transistor considering gate work-function
- 저자
- Han, Kyoung-Rok; Choi, Byung-Kil; Kwon, Hyuck-In; Lee, Jong-Ho
- 발행일
- 2008-06
- 유형
- Article
- 권
- 47
- 호
- 6
- 페이지
- 4385 ~ 4391
- 언어
- ENG
- 출판사
- IOP PUBLISHING LTD
- 발행국가
- 영국
- 분량
- 7 페이지
- ISSN
- E 1347-4065
P 0021-4922