Design of bulk fin-type field-effect transistor considering gate work-function

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초록

We proposed a new body-tied triple-gate fin-type field-effect transistor (bulk FinFET) which has different gate work-functions on the top-and side-channel regions. The effect of gate work-function on the characteristics of the bulk FinFETs was studied by using three-dimensional device simulator. By increasing the top-gate work-function ((phi(TG)) at a fixed side-gate work-function ((phi(SG)) of the bulk FinFET, threshold voltage (V-th) increases and off-state leakage current (I (off)) reduces significantly without increasing doping concentration of the fin body. The bulk FinFETs with the low body doping and the threshold voltage controlled by midgap-gate work-function shown very small dependence on the comer shape, but shown very poor short channel effect (SCE). It was also shown that devices with the V-th controlled by body doping shows significant corner effect and the effect becomes small as the fin width decreases. By applying our approach, we could reduce the off-current by more than 10 times without increasing fin body doping concentration.

키워드

bulk FinFET; triple-gate; work-function; corner effect; short channel effect; THRESHOLD-VOLTAGE; SPACER
제목
Design of bulk fin-type field-effect transistor considering gate work-function
저자
Han, Kyoung-Rok; Choi, Byung-Kil; Kwon, Hyuck-In; Lee, Jong-Ho
DOI
10.1143/JJAP.47.4385
발행일
2008-06
유형
Article
저널명
Japanese Journal of Applied Physics
권
47
호
6
페이지
4385 ~ 4391