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Electrodeposition of Cu in the PEI-PEG-Cl-SPS additive system - Reduction of overfill bump formation during superfilling
- Kim, Soo-Kil;
- Josell, D.;
- Moffat, T. P.
WEB OF SCIENCE
131SCOPUS
141초록
The impact of branched polyethyleneimine (PEI) on Cu electrodeposition from an acidified cupric sulfate electtrolyte containing a combination of superfilling additives, specifically polyethylene glycol, bis(3-sulfopropyl)disulfide, and chloride (PEG-Cl-SPS), is examined. Electroanalytical measurements reveal that adsorption of cationic PEI leads to inhibition of the metal deposition reaction to an extent similar to that provided by PEG-Cl adsorption. However, unlike the PEG-Cl suppressor, PEI is shown to deactivate adsorbed SPS accelerator. As a result, addition of PEI quenches the hysteretic voltammetric response that is a signature of competitive adsorption in the PEG-Cl-SPS additive system. Trench-filling experiments in a PEI-PEG-Cl-SPS electrolyte demonstrate that the deactivating interaction between PEI adsorption and adsorbed SPS can be optimized to prevent overfill bump formation without substantial detrimental impact on bottom-up, void-free feature filling. (c) 2006 The Electrochemical Society.
키워드
- 제목
- Electrodeposition of Cu in the PEI-PEG-Cl-SPS additive system - Reduction of overfill bump formation during superfilling
- 저자
- Kim, Soo-Kil; Josell, D.; Moffat, T. P.
- 발행일
- 2006-09
- 유형
- Article
- 권
- 153
- 호
- 9
- 페이지
- C616 ~ C622
- 언어
- ENG
- 출판사
- ELECTROCHEMICAL SOC INC
- 발행국가
- 미국
- ISSN
- E 1945-7111
P 0013-4651