Seed Repair by Electrodeposition in Pyrophosphate Solution for Acid Cu Superfilling

  • Choe, Seunghoe; 
  • Kim, Myung Jun; 
  • Kim, Hoe Chul; 
  • Lim, Taeho; 
  • Park, Kyung Ju; 
  • ... Kim, Soo-Kil; 
  • 외 2명
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초록

Seed layer repairing, a complementary technology to the fabrication of continuous Cu seed layers for acid Cu superfilling, was carried out in alkaline pyrophosphate solution by modified two-step electrodeposition. A short potential pulse was applied for nucleation prior to the second step, which was application of a lower potential for growth. This technique increased the surface coverage of damaged Cu seed layers from 78.10% to 99.46%. It was also shown to have the ability to repair an artificially damaged Cu seed layer with a 55 nm wide trench and to guarantee successful filling performance. (C) 2013 The Electrochemical Society. [DOI: 10.114912.028306jes] All rights reserved.

키워드

PHYSICAL VAPOR-DEPOSITION; COPPER ELECTRODEPOSITION; ADDITIVE SYSTEM; STEP COVERAGE; LAYER; SPS; TA; ACCELERATOR; ELECTROLYTE; BARRIER
제목
Seed Repair by Electrodeposition in Pyrophosphate Solution for Acid Cu Superfilling
저자
Choe, Seunghoe; Kim, Myung Jun; Kim, Hoe Chul; Lim, Taeho; Park, Kyung Ju; Cho, Sung Ki; Kim, Soo-Kil; Kim, Jae Jeong
DOI
10.1149/2.028306jes
발행일
2013-04
유형
Article
저널명
Journal of the Electrochemical Society
권
160
호
4
페이지
D202 ~ D205