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Seed Repair by Electrodeposition in Pyrophosphate Solution for Acid Cu Superfilling
- Choe, Seunghoe;
- Kim, Myung Jun;
- Kim, Hoe Chul;
- Lim, Taeho;
- Park, Kyung Ju;
- ... Kim, Soo-Kil;
- 외 2명
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13초록
Seed layer repairing, a complementary technology to the fabrication of continuous Cu seed layers for acid Cu superfilling, was carried out in alkaline pyrophosphate solution by modified two-step electrodeposition. A short potential pulse was applied for nucleation prior to the second step, which was application of a lower potential for growth. This technique increased the surface coverage of damaged Cu seed layers from 78.10% to 99.46%. It was also shown to have the ability to repair an artificially damaged Cu seed layer with a 55 nm wide trench and to guarantee successful filling performance. (C) 2013 The Electrochemical Society. [DOI: 10.114912.028306jes] All rights reserved.
키워드
PHYSICAL VAPOR-DEPOSITION; COPPER ELECTRODEPOSITION; ADDITIVE SYSTEM; STEP COVERAGE; LAYER; SPS; TA; ACCELERATOR; ELECTROLYTE; BARRIER
- 제목
- Seed Repair by Electrodeposition in Pyrophosphate Solution for Acid Cu Superfilling
- 저자
- Choe, Seunghoe; Kim, Myung Jun; Kim, Hoe Chul; Lim, Taeho; Park, Kyung Ju; Cho, Sung Ki; Kim, Soo-Kil; Kim, Jae Jeong
- 발행일
- 2013-04
- 유형
- Article
- 권
- 160
- 호
- 4
- 페이지
- D202 ~ D205
- 언어
- ENG
- 출판사
- ELECTROCHEMICAL SOC INC
- 발행국가
- 미국
- ISSN
- E 1945-7111
P 0013-4651