상세 보기
Dopant concentration dependent resistive switching characteristics in Cu/SiNx/Si structure
- Kim, Sungjun;
- Kim, Min-Hwi;
- Kim, Tae-Hyeon;
- Cho, Seongjae;
- Park, Byung-Gook
WEB OF SCIENCE
8SCOPUS
8초록
In this paper, dopant concentration dependent resistive switching characteristics in a SiNx-based resistive random-access memory (RRAM) device are investigated. The device with low dopant concentration (similar to 10(18) cm(-3)) shows only unipolar switching due to the suppressed reverse current. The result of conduction mechanism analyses for LRS indicates that conducting transport follows the thermionic emission, which has a strong temperature dependence. On the other hand, both unipolar and bipolar switching are observed in the device with high dopant concentration (similar to 10(20) cm(-3)). It is found that forward current/reverse current (F/R) ratio can be maximized by reducing doping concentration and compliance current (I-CC). (C) 2016 Elsevier B.V. All rights reserved.
키워드
- 제목
- Dopant concentration dependent resistive switching characteristics in Cu/SiNx/Si structure
- 저자
- Kim, Sungjun; Kim, Min-Hwi; Kim, Tae-Hyeon; Cho, Seongjae; Park, Byung-Gook
- 발행일
- 2016-11
- 유형
- Article
- 권
- 686
- 페이지
- 479 ~ 483
- 언어
- ENG
- 출판사
- ELSEVIER SCIENCE SA
- 발행국가
- 스위스
- 분량
- 5 페이지
- ISSN
- E 1873-4669
P 0925-8388