Dopant concentration dependent resistive switching characteristics in Cu/SiNx/Si structure

  • Kim, Sungjun; 
  • Kim, Min-Hwi; 
  • Kim, Tae-Hyeon; 
  • Cho, Seongjae; 
  • Park, Byung-Gook
Citations

WEB OF SCIENCE

8
Citations

SCOPUS

8

초록

In this paper, dopant concentration dependent resistive switching characteristics in a SiNx-based resistive random-access memory (RRAM) device are investigated. The device with low dopant concentration (similar to 10(18) cm(-3)) shows only unipolar switching due to the suppressed reverse current. The result of conduction mechanism analyses for LRS indicates that conducting transport follows the thermionic emission, which has a strong temperature dependence. On the other hand, both unipolar and bipolar switching are observed in the device with high dopant concentration (similar to 10(20) cm(-3)). It is found that forward current/reverse current (F/R) ratio can be maximized by reducing doping concentration and compliance current (I-CC). (C) 2016 Elsevier B.V. All rights reserved.

키워드

Resistive random-access memory (RRAM); Silicon nitride (Si3N4); Dopant concentration; Switching mechanism; RANDOM-ACCESS MEMORY; CERIA THIN-FILMS; LOW-POWER; PARAMETERS; MECHANISM; BEHAVIOR; SILICON; BIPOLAR; CELLS
제목
Dopant concentration dependent resistive switching characteristics in Cu/SiNx/Si structure
저자
Kim, Sungjun; Kim, Min-Hwi; Kim, Tae-Hyeon; Cho, Seongjae; Park, Byung-Gook
DOI
10.1016/j.jallcom.2016.06.055
발행일
2016-11
유형
Article
저널명
Journal of Alloys and Compounds
권
686
페이지
479 ~ 483