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AC Stress-Induced Degradation of Amorphous InGaZnO Thin Film Transistor Inverter
- Kim, Dae-Hwan;
- Kong, Dongsik;
- Kim, Sungchul;
- Jeon, Young Woo;
- Kim, Yongsik;
- ... Kwon, Hyuck-In;
- 외 1명
Citations
WEB OF SCIENCE
3Citations
SCOPUS
4초록
The degradation of amorphous indium-gallium-zinc-oxide (a-IGZO) thin film transistor (TFT) inverter operation is investigated under AC pulse stresses. From the extraction of subgap density of states (DOSs), the dominant mechanism of the pulse stress-induced degradation of driver TFT is considered as the increase of acceptor-like deep states, while that of the load TFT is attributed to the increased number of electrons trapped into the interface and/or a-IGZO thin films. We also observe that the rising and falling time of the induced pulse affects each TFT of the inverter in a different manner, and discuss the related mechanism of this phenomenon. (C) 2011 The Japan Society of Applied Physics
키워드
OXIDE; INSTABILITY
- 제목
- AC Stress-Induced Degradation of Amorphous InGaZnO Thin Film Transistor Inverter
- 저자
- Kim, Dae-Hwan; Kong, Dongsik; Kim, Sungchul; Jeon, Young Woo; Kim, Yongsik; Kim, Dong Myong; Kwon, Hyuck-In
- 발행일
- 2011-09
- 유형
- Article
- 권
- 50
- 호
- 9
- 언어
- ENG
- 출판사
- IOP PUBLISHING LTD
- 발행국가
- 일본
- ISSN
- E 1347-4065
P 0021-4922