AC Stress-Induced Degradation of Amorphous InGaZnO Thin Film Transistor Inverter

  • Kim, Dae-Hwan; 
  • Kong, Dongsik; 
  • Kim, Sungchul; 
  • Jeon, Young Woo; 
  • Kim, Yongsik; 
  • ... Kwon, Hyuck-In; 
  • 외 1명
Citations

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3
Citations

SCOPUS

4

초록

The degradation of amorphous indium-gallium-zinc-oxide (a-IGZO) thin film transistor (TFT) inverter operation is investigated under AC pulse stresses. From the extraction of subgap density of states (DOSs), the dominant mechanism of the pulse stress-induced degradation of driver TFT is considered as the increase of acceptor-like deep states, while that of the load TFT is attributed to the increased number of electrons trapped into the interface and/or a-IGZO thin films. We also observe that the rising and falling time of the induced pulse affects each TFT of the inverter in a different manner, and discuss the related mechanism of this phenomenon. (C) 2011 The Japan Society of Applied Physics

키워드

OXIDE; INSTABILITY
제목
AC Stress-Induced Degradation of Amorphous InGaZnO Thin Film Transistor Inverter
저자
Kim, Dae-Hwan; Kong, Dongsik; Kim, Sungchul; Jeon, Young Woo; Kim, Yongsik; Kim, Dong Myong; Kwon, Hyuck-In
DOI
10.1143/JJAP.50.090202
발행일
2011-09
유형
Article
저널명
Japanese Journal of Applied Physics
권
50
호
9